KnE Engineering

ISSN: 2518-6841

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The Effect of Copper and Manganese on the Amorphization Process in a Thin Fe–Si–Mg–O Film

Published date:Apr 15 2019

Journal Title: KnE Engineering

Issue title: XIX International scientific-technical conference “The Ural school-seminar of metal scientists-young researchers”

Pages:164–169

DOI: 10.18502/keg.v1i1.4405

Authors:
Abstract:

The effect of copper and manganese on the amorphization process in the surface layer of a technical Fe-3% Si alloy during annealing in the α → γ transition temperature range was determined by x-ray phase analysis. The presence of 0.5 wt. % Cu and 0.3 wt. % Mn in the initial Fe-3% Si solid solution significantly enhances the amorphization process that occurs when heated in the temperature range 920… 960∘C as an alternative to the α → γ phase transformation. The effect of amplification of amorphization is both in obtaining a larger amount of material in the amorphous state, and in the appearance of two amorphous phases, differing in average interatomic distance. The composition of the amorphous phase is approximately described as Fe89Si6Mg4Mn0.5Cu0.5 in the presence of Cu and Mn atoms and Fe90Si6Mg4 in the case of their absence in the amorphous layer.

 

 

Keywords: amorphization, non-ambient x-ray diffraction, Fe-3%Si, phase transition, thermal stability.

References:

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