KnE Energy

ISSN: 2413-5453

The latest conference proceedings on energy science, applications and resources

Holographic Structure Transfer from Dichromated Gelatin Layers to a Polymethylmethacrylate Substrate

Published date: Apr 25 2018

Journal Title: KnE Energy

Issue title: VII International Conference on Photonics and Information Optics (PhIO)

Pages: 450–457

DOI: 10.18502/ken.v3i3.2059

Authors:
Abstract:

It is shown that the formation of a holographic structure on the polymethylmethacrylate (PMMA) surface is based on the use of the destructive effect of short-wave UV radiation with a wavelength less than 270 nm through windows previously formed in a thin layer of dichromated gelatin (DCG) covering the substrate. The optimization of the PMMA surface treatment by isopropanol and methylisobutyl ketone (MIBK) developers was made, which allowed creating on the PMMA substrates relief-phase holographic gratings with the high diffraction efficiency (DE) of about 25% and maximum depth of the surface relief of the order of 1 μm.

Keywords: holographic gratings, surface relief, UV radiation, dichromated gelatin, polymethylmethacrylate, methylisobutyl ketone (MIBK).

References:

[1] S. N. Gulyaev and V. P. Ratushnyi, “Properties of relief-phase holograms produced by processing photographic plates with short-wavelength UV radiation and with two-stage bleaching,” J. Opt. Technol, vol. 70, pp. 105-108., 2003.


[2] N. M. Ganzherli, S. N. Gulyaev, and I. A. Maurer, “The Effect of UV Radiation on the Properties of Diffraction Gratings Based on Dichromated Gelatin”, Technical Physics Letters, vol. 42, no. 10, pp. 988–989, 2016.


[3] O. N. Kozakov and S. A. Kulipanov, “Absorption of radiation by bromine silver emulsion layers in the ultraviolet region of the spectrum,” Zh. Nauchn. Prikl. Fotogr, vol. 39, no. 1, pp. 17–22, 1994.


[4] N. M. Ganzherli, S. N. Gulyaev, and I. A. Maurer, “Properties of holographic structures on dichromated gelatine exposed by the short-wave UV radiation,” J. Opt. Technol, vol. 84, no. 9, pp. 617–620, 2017.


[5] M.A. McCord, M.J. Rooks, “Handbook of Microlithography, Micromachining and Microfabrication,” Editor: P. Rai-Choudhury. vol. 1: Microlithography. Chapter 2. Electron Beam Lithography. Bellingham, Washington: SPIE Optical Engineering P, 1997. pp. 139–250, 1997.


[6] U. Moro, Microlithography, M.: Mir, Part 1, 605 p., Part 2, 632 p.


[7] M. Haiducu, M. Rahbar, I.G. Foulds, R.W. Johnstone, D. Sameoto, and M.J.Parameswaran, “Deep-UV patterning of commercial grade PMMA for lowcost, large-scale microfluidics,” Micromech. Microeng, vol. 18, no. 11, pp. 115029, 2008.


[8] R.W. Johnstone, I.G. Foulds, M.J. Parameswaran, “Deep-UV exposure of poly(methyl methacrylate) at 254 nm using low-pressure mercury vapor lamps,” Journal of Vacuum Science & Technology, B. Microelectronics and nanometer structures: processing, measurement, and phenomena, vol. 26. no. 2, pp. 682–685, 2008.


[9] T.A. Shankoff, “Phase Holograms in Dichromated Gelatni,” Appl. Opt., vol. 7, no. 10, pp. 2101-2105, 1968.


[10] C.F. Hoole, M.E. Welland, and A. N. Broers, “Negative PMMA as a high-resolution resist — the limits and possibilities,” Semiconductor Science and Technology, vol. 12, no. 9, pp. 1166–1170, 1997.


[11] M. J. Rooks, E. Kratschmer, and R. Viswanathan, J. Katine, R. E. Fontana Jr., and S. A. MacDonald, “Low stress development of polymethylmethacrylate for high aspect ratio structures,” Journal of Vacuum Science & Technology, B. Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena, vol. 20, no. 6, pp. 2937-2941, 2000.

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